SKRYPNYK, I.I.; NICHKALO, S.I.; SHTANGRET, N.O. The effect of clustering of Si nanowires produced by the metal-assisted chemical etching method on their anti-reflecting properties. Physics and Chemistry of Solid State, [S. l.], v. 25, n. 4, p. 903–909, 2024. DOI: 10.15330/pcss.25.4.903-909. Disponível em: https://ktipe.pnu.edu.ua/index.php/pcss/article/view/8535. Acesso em: 7 jan. 2025.