Умови імпульсного газорозрядного синтезу тонких плівок оксиду вольфраму з плазми на суміші повітря з парами вольфраму

R.V. Hrytsak; O.K. Shuaibov; O.Y. Minya; A.O. Malinina; I.V. Shevera; Yu.Yu. Bilak; Z.T. Homoki

doi:10.15330/pcss.25.4.684-688

Authors

R.V. Hrytsak Uzhhorod National University, Uzhhorod, Ukraine
O.K. Shuaibov Uzhhorod National University, Uzhhorod, Ukraine
O.Y. Minya Uzhhorod National University, Uzhhorod, Ukraine
A.O. Malinina Uzhhorod National University, Uzhhorod, Ukraine
I.V. Shevera Uzhhorod National University, Uzhhorod, Ukraine
Yu.Yu. Bilak Uzhhorod National University, Uzhhorod, Ukraine
Z.T. Homoki Uzhhorod National University, Uzhhorod, Ukraine

DOI:

https://doi.org/10.15330/pcss.25.4.684-688

Keywords:

overvoltage nanosecond discharge, tungsten, air, thin films, radiation spectrum, plasma

Abstract

Characteristics of high-voltage nanosecond discharge in gas-vapor mixtures "Air – W" at air pressures p = 101.13; 13.3 kPa are provided. The discharge was ignited between tungsten electrodes. Formation of tungsten oxide clusters in the plasma occurred during the introduction of tungsten vapors into the discharge gap via an electron mechanism, creating conditions for the synthesis of thin tungsten oxide (WO₃) films deposited on a glass substrate.

The optical properties of the discharge from the central region of a 2 mm-wide gap were investigated. The main components responsible for excitation in the plasma of a tungsten-based vapor-gas mixture with air were identified. Examination of the Raman spectra of laser-scattered radiation by the experimentally synthesized thin films revealed them to be island-like films of tungsten oxide (WO₃).

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